...with a large accommodation coefficient is the preferred deposition site in VLS The surface of the growth. metal catalyst substrate catalytic liquid kink atom
Which techniques operates at high-pressure characteristics of the fluid Electrodeposition Laser ablation Sputtering Hot filament metal vapor deposition
Which of the following is true for the smaller diffusion distance than the distance between growth sites. all growth species will incorporate into the crystal n accommodation coefficient will be zero O accommodation coefficient will be unity all growth species will escape to the vapor
............. structure appears in the amorphous and crystalline deposition as a result of the shadowing effect that overcomes limited adatom surface diffusion. O Zone T Zone 1 Zone 3 Zone 2
What are responsible for the anisotropic growth of many nanowires or nanorods grown by the evaporation- condensation method O Catalysts Micro-twins O Stacking faults Impurities